Process Control

Control of a Laboratory Chemical Reactor Using Robust PI Controller

J. Závacká, M. Bakošová, K. Vaneková
Slovak University of Technology in Bratislava

Abstract

The paper presents a method for design of robust PI controllers for systems with interval uncertainty. The method is based on plotting the stability boundary locus in the (kp, ki)-plane. Then parameters of stabilizing PI controllers are determined. The designed robust PI controller is used for control of a laboratory chemical continuous stirred tank reactor Armfield PCT40. The reactor is used for preparing of NaCl solution with desired concentration. The conductivity of the solution is the controlled variable and the volumetric flow rate of water is the control variable.

Full paper

054.pdf

Session

Robust and Adaptive Control (Lecture)

Reference

Závacká, J., Bakošová, M., Vaneková, K.: Control of a Laboratory Chemical Reactor Using Robust PI Controller. Editors: Fikar, M., Kvasnica, M., In Proceedings of the 17th International Conference on Process Control ’09, Štrbské Pleso, Slovakia, 363–367, 2009

BibTeX
@inProceedings{pc09-054,
author = {Závacká, J. and Bakošová, M. and Vaneková, K.},
title = {Control of a Laboratory Chemical Reactor Using Robust PI Controller},
booktitle = {Proceedings of the 17th International Conference on Process Control '09},
year = {2009},
pages = {363-367},
editor = {Fikar, M. and Kvasnica, M.},
address = {Štrbské Pleso, Slovakia},
publisher = {Slovak University of Technology in Bratislava},
url = {http://www.kirp.chtf.stuba.sk/pc09/data/papers/054.pdf}}
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